The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2020

Filed:

Sep. 20, 2017
Applicant:

Essilor International, Charenton-le-Pont, FR;

Inventors:

Haifeng Shan, Shrewsbury, MA (US);

Hao Wen Chiu, Holden, MA (US);

Aref Jallouli, Shrewsbury, MA (US);

Assignee:

ESSILOR INTERNATIONAL, Charenton-le-Pont, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02C 7/10 (2006.01); B29D 11/00 (2006.01); C08K 5/00 (2006.01);
U.S. Cl.
CPC ...
G02C 7/104 (2013.01); B29D 11/00634 (2013.01); C08K 5/0041 (2013.01); G02C 2202/10 (2013.01);
Abstract

A blue-cut wafer can be coupled to a lens, such that the blue-cut wafer can be configured to reduce by absorption at least a portion of light having a first wavelength range from 400 nanometers to 500 nanometers, preferably from 400 nanometers to 460 nanometers. The blue-cut wafer can permit light having a second wavelength range, the second wavelength range being greater than the first wavelength range, and homogenize a color appearance and a blue-cut performance level of the blue-cut wafer based on the blue-cut wafer having a maximum thickness and a minimum thickness within twenty percent of a nominal thickness of the blue-cut wafer.


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