The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2020
Filed:
Jul. 22, 2011
Torsten Schmauder, Egelsbach, DE;
Gunter Kern, Bruchkobel, DE;
Torsten Schmauder, Egelsbach, DE;
Gunter Kern, Bruchkobel, DE;
Leybold Optics GmbH, Alzenau, DE;
Abstract
The invention relates to a device for vacuum coating substrates in a vacuum chamber, comprising an elongated evaporator array having a plurality of evaporator elements arranged along a longitudinal axis and a first substrate carrier unit which is associated with the evaporator array and has a first pylon that can be rotated about a first axis and contains retaining means for substrates, wherein an angular offset of less than 10° is present between the longitudinal axis and the first rotational axis. The device is characterised in that at least one second substrate carrier unit is provided, which is associated with the evaporator array and has a second pylon that can be rotated about a second axis and contains retaining means for substrates, wherein an angular offset of less than 10° is present between the longitudinal axis and the second rotational axis. At least one second substrate carrier unit () which is associated with the evaporator array () and has a second pylon that can be rotated about a second rotational axis () and contains retaining means for substrates is provided, wherein the axes of the pylons are designed to be fixed relative to the longitudinal axis () of the evaporator array, an angular offset of less than 10° is present between the longitudinal axis () and second rotational axis (), and a geometric configuration of the evaporator array () and of the first () and the at least second substrate carrier units () is provided such that substrates of the first () and the at least second substrate carrier units () can be coated with the same quality by means of the evaporator array (). The invention further relates to a method for vacuum coating by means of the device.