The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2020

Filed:

May. 09, 2017
Applicant:

Kymeta Corporation, Redmond, WA (US);

Inventors:

Steven Linn, Redmond, WA (US);

Robert Morey, Redmond, WA (US);

Stephen Olfert, Redmond, WA (US);

Andrew Turner, Redmond, WA (US);

Matthew Riley, Redmond, WA (US);

Jonathan Mallari, Redmond, WA (US);

Colin Stuart Short, Redmond, WA (US);

Assignee:

KYMETA CORPORATION, Redmond, WA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01Q 3/36 (2006.01); H01Q 19/17 (2006.01); H01Q 21/00 (2006.01); H01Q 21/20 (2006.01); H01Q 3/24 (2006.01); H01Q 3/28 (2006.01); H01Q 3/40 (2006.01); H05K 13/04 (2006.01);
U.S. Cl.
CPC ...
H01Q 3/36 (2013.01); H01Q 3/242 (2013.01); H01Q 3/28 (2013.01); H01Q 3/40 (2013.01); H01Q 19/175 (2013.01); H01Q 21/005 (2013.01); H01Q 21/0087 (2013.01); H01Q 21/205 (2013.01); H05K 13/0469 (2013.01); Y10T 29/49016 (2015.01); Y10T 29/49131 (2015.01);
Abstract

A method of assembling an antenna aperture from a plurality of antenna aperture segments is described. The method may include placing a first aperture segment relative to a second aperture segment to partially form the antenna aperture. Furthermore, an overlap of the first aperture segment overlaps a complementary underlap of the second aperture segment at a seam. The method may also include joining the overlap of the first aperture segment to the underlap of the second aperture segment to partially form the antenna aperture.


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