The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2020

Filed:

Aug. 16, 2019
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventor:

Satoshi Takano, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D 5/00 (2006.01); H01L 21/67 (2006.01); C23C 16/44 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67178 (2013.01); C23C 16/4412 (2013.01); H01L 21/67184 (2013.01); H01L 21/67766 (2013.01); H01L 21/67781 (2013.01);
Abstract

For enhancing productivity, an apparatus comprises a vertical type process furnace configured to simultaneously process N substrates (1<N); a loading chamber provided under the vertical type process furnace and configured to transfer the substrate retainer into or out of the vertical type process furnace; a plurality of single-wafer type process furnaces provided adjacent to the loading chamber, each of the plurality of single-wafer type process furnaces being stacked in at least 2 stages and configured to simultaneously process M substrates (M<N); and a transfer chamber module provided adjacent to the loading chamber and the plurality of the single-wafer type process furnaces and provided with a transfer device.


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