The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2020
Filed:
Aug. 18, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); C23C 14/35 (2006.01); G03F 1/22 (2012.01); C23C 14/56 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3458 (2013.01); C23C 14/345 (2013.01); C23C 14/3407 (2013.01); C23C 14/3492 (2013.01); C23C 14/35 (2013.01); C23C 14/564 (2013.01); G03F 1/22 (2013.01); H01J 37/32651 (2013.01); H01J 37/32669 (2013.01); H01J 37/3405 (2013.01);
Abstract
Physical vapor deposition processing chambers and methods of processing a substrate such as an EUV mask blank in a physical vapor deposition chamber are disclosed. An electric field and a magnetic field are utilized to deflect particles from a substrate being processed in the chamber.