The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2020
Filed:
Jan. 12, 2017
Applicant:
Laser Systems & Solutions of Europe, Gennevilliers, FR;
Inventors:
Paul Ceccato, Paris, FR;
Hervé Besaucèle, La Celle Saint Cloud, FR;
Assignee:
LASER SYSTEMS & SOLUTIONS OF EUROPE, Gennevilliers, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/08 (2006.01); H01J 35/20 (2006.01); H01S 3/0971 (2006.01); H01J 35/04 (2006.01); H01J 47/02 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
H01J 35/08 (2013.01); H01J 35/04 (2013.01); H01J 35/20 (2013.01); H01J 47/026 (2013.01); H01S 3/09713 (2013.01); H01S 3/09716 (2013.01); H05H 1/24 (2013.01); H01J 35/116 (2019.05);
Abstract
Disclosed is a low pressure wire ion plasma discharge source including an elongated ionization chamber housing at least two parallel anode wires extending longitudinally within the ionization chamber. A first of the at least two anode wires is connected to a DC voltage supply and a second of the at least two anode wires is connected to a pulsed voltage supply.