The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2020
Filed:
Dec. 22, 2017
China Petroleum & Chemical Corporation, Beijing, CN;
Sinopec Tech Houston, Llc., Houston, TX (US);
Mingqiu Luo, Houston, TX (US);
Ning Dong, Houston, TX (US);
CHINA PETROLEUM & CHEMICAL CORPORATION, Beijing, CN;
Abstract
New methods for calculating acquisition illumination are computationally less expensive in comparison with conventional methods. In one such new method, source wavefield propagations are calculated and assigned to corresponding zero-offset receivers. Further, the number of non-zero-offset receivers within the coverage of the shot at the source location is decimated. Such a method is most advantages in reverse time migration, in which all source wavefield propagations are already calculated. The receiver-side illumination for each shot can be obtained by summing up all the source-side illumination with the source located within receiver coverage. All the source-side illumination and receiver-side illumination can be summed up to get the acquisition illumination for the survey. The acquisition illumination can be used to value the acquisition system and to compensate the migration images.