The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2020
Filed:
Jul. 13, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Lakmal C. Kalutarage, San Jose, CA (US);
Mark Saly, Santa Clara, CA (US);
Thomas Knisley, Monroe, MI (US);
Benjamin Schmiege, Santa Clara, CA (US);
David Thompson, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/34 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45553 (2013.01); C23C 16/34 (2013.01); C23C 16/4584 (2013.01); C23C 16/52 (2013.01); C23C 16/56 (2013.01);
Abstract
Methods for depositing a yttrium-containing film through an atomic layer deposition process are described. Some embodiments of the disclosure utilize a plasma-enhanced atomic layer deposition process. Also described is an apparatus for performing the atomic layer deposition of the yttrium containing films.