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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10760155 B1

PDFFull Text
Date of Patent:
Sep. 01, 2020

Filed:

Sep. 20, 2016

Vapor deposition source and vapor deposition device for producing vapor deposition film with high material usage efficiency

Applicant:

Sharp Kabushiki Kaisha, Sakai, Osaka, JP;

Inventors:

Satoshi Inoue, Sakai, JP;

Shinichi Kawato, Sakai, JP;

Manabu Niboshi, Sakai, JP;

Yuhki Kobayashi, Sakai, JP;

Assignee:

SHARP KABUSHIKI KAISHA, Sakai, JP;

Attorney:

Keating & Bennett, LLP

Primary Examiner:

Bret P Chen

Int. Cl.
CPC ...
C23C 14/24 (2006.01); H01L 51/50 (2006.01); C23C 14/04 (2006.01); H05B 33/10 (2006.01); H05B 33/14 (2006.01); C23C 14/12 (2006.01); H01L 51/00 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
C23C 14/243 (2013.01); C23C 14/042 (2013.01); C23C 14/12 (2013.01); H01L 51/50 (2013.01); H01L 51/5012 (2013.01); H05B 33/10 (2013.01); H05B 33/14 (2013.01); H01L 51/001 (2013.01); H01L 51/5048 (2013.01); H01L 51/56 (2013.01);
Abstract

To provide a vapor deposition source of which material usage efficiency is higher as compared with the related art. A vapor deposition source () includes a vapor deposition particles ejecting unit () configured to include multistage of nozzle units layered apart from each other in a vertical direction, each of the nozzle units including at least one vapor deposition nozzle (), and at least one space part () provided between the multistage of vapor deposition nozzles, and a vacuum exhaust unit () connected with the at least one space part ().

Find Patent Forward Citations

Inoue, Satoshi. (2020). Vapor deposition source and vapor deposition device for producing vapor deposition film with high material usage efficiency (U.S. Patent No. 10760155). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10760155

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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