The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2020
Filed:
Sep. 20, 2016
Applicant:
Sharp Kabushiki Kaisha, Sakai, Osaka, JP;
Inventors:
Satoshi Inoue, Sakai, JP;
Shinichi Kawato, Sakai, JP;
Manabu Niboshi, Sakai, JP;
Yuhki Kobayashi, Sakai, JP;
Assignee:
SHARP KABUSHIKI KAISHA, Sakai, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/24 (2006.01); H01L 51/50 (2006.01); C23C 14/04 (2006.01); H05B 33/10 (2006.01); H05B 33/14 (2006.01); C23C 14/12 (2006.01); H01L 51/00 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
C23C 14/243 (2013.01); C23C 14/042 (2013.01); C23C 14/12 (2013.01); H01L 51/50 (2013.01); H01L 51/5012 (2013.01); H05B 33/10 (2013.01); H05B 33/14 (2013.01); H01L 51/001 (2013.01); H01L 51/5048 (2013.01); H01L 51/56 (2013.01);
Abstract
To provide a vapor deposition source of which material usage efficiency is higher as compared with the related art. A vapor deposition source () includes a vapor deposition particles ejecting unit () configured to include multistage of nozzle units layered apart from each other in a vertical direction, each of the nozzle units including at least one vapor deposition nozzle (), and at least one space part () provided between the multistage of vapor deposition nozzles, and a vacuum exhaust unit () connected with the at least one space part ().