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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10759678 B1

PDFFull Text
Date of Patent:
Sep. 01, 2020

Filed:

Mar. 14, 2017

Dilute chemical solution producing apparatus and dilute chemical solution producing method

Applicant:

Kurita Water Industries Ltd., Tokyo, JP;

Inventors:

Yu Fujimura, Tokyo, JP;

Nobuko Gan, Tokyo, JP;

Hiroto Tokoshima, Tokyo, JP;

Assignee:

KURITA WATER INDUSTRIES LTD., Tokyo, JP;

Attorney:

Posz Law Group, PLC

Primary Examiner:

Natasha E Young

Int. Cl.
CPC ...
C02F 1/20 (2006.01); C02F 1/68 (2006.01); C02F 1/44 (2006.01); B01D 19/00 (2006.01); B01J 23/42 (2006.01); H01L 21/02 (2006.01); H01L 21/30 (2006.01); G03F 1/82 (2012.01); B08B 3/08 (2006.01); B01F 1/00 (2006.01); B01F 5/06 (2006.01); C02F 1/58 (2006.01); H01L 21/304 (2006.01); C02F 103/04 (2006.01);
U.S. Cl.
CPC ...
C02F 1/20 (2013.01); B01D 19/0005 (2013.01); B01D 19/0031 (2013.01); B01D 19/0036 (2013.01); B01D 19/0068 (2013.01); B01F 1/00 (2013.01); B01F 5/06 (2013.01); B01J 23/42 (2013.01); B08B 3/08 (2013.01); C02F 1/58 (2013.01); C02F 1/68 (2013.01); G03F 1/82 (2013.01); H01L 21/02052 (2013.01); H01L 21/304 (2013.01); C02F 1/444 (2013.01); C02F 2103/04 (2013.01);
Abstract

A dilute chemical solution producing apparatus includes, in a supply line of ultrapure water, a platinum group metal carrying resin column, a membrane-type deaeration apparatus, and a gas dissolving membrane apparatus, and a washing chemical solution injection apparatus is provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas source is connected to a gas phase side of the membrane-type deaeration apparatus, and an inert gas source is also connected to a gas phase side of the gas dissolving membrane apparatus. A discharge line communicates with the gas dissolving membrane apparatus. With such a dilute chemical solution producing apparatus, a dilute chemical solution with both dissolved oxygen and dissolved hydrogen peroxide being removed can be safely produced and supplied in a washing step for semiconductor washing.

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