The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2020

Filed:

Apr. 17, 2018
Applicant:

Government of the United States, As Represented BY the Secretary of the Air Force, Wright-Patterson AFB, OH (US);

Inventors:

Richard A. Vaia, Beavercreek, OH (US);

Kyoungweon Park, Beavercreek, OH (US);

Assignee:

Other;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22F 9/24 (2006.01); B22F 1/00 (2006.01); C22B 3/00 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B22F 9/24 (2013.01); B22F 1/0018 (2013.01); C22B 11/04 (2013.01); B22F 2301/255 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); Y10S 977/762 (2013.01); Y10S 977/81 (2013.01); Y10S 977/896 (2013.01);
Abstract

A method for synthesizing nanostructures includes introducing a solution of seed crystals into an initial growth solution to form a nanostructure synthesis mixture. The initial growth solution includes a precursor material and a reducing agent in a surfactant solution. Growth of nanostructures in the nanostructure synthesis mixture is monitored during a period of anisotropic growth of the nanostructures to determine a shift from stage II growth of the nanostructures to stage III growth of the nanostructures. The shift from stage II growth to stage III growth is identified, and after identifying the shift, a second growth solution is added to the nanostructure synthesis mixture coincident in time with the shift. The second growth solution includes the precursor material and the reducing agent in the surfactant solution.


Find Patent Forward Citations

Loading…