The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2020

Filed:

Oct. 14, 2016
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Takenori Watabe, Annaka, JP;

Ryo Mitta, Annaka, JP;

Hiroshi Hashigami, Annaka, JP;

Hiroyuki Ohtsuka, Karuizawa-machi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0352 (2006.01); H01L 31/0224 (2006.01); H01L 31/18 (2006.01); H01L 31/05 (2014.01);
U.S. Cl.
CPC ...
H01L 31/03529 (2013.01); H01L 31/022425 (2013.01); H01L 31/022441 (2013.01); H01L 31/0504 (2013.01); H01L 31/18 (2013.01); H01L 31/1876 (2013.01); Y02E 10/50 (2013.01); Y02P 70/521 (2015.11);
Abstract

A method for manufacturing a solar cell having preparing a semiconductor substrate having a dielectric film on at least a first main surface, partially removing the dielectric film of the semiconductor substrate, and forming an electrode along a region where the dielectric film is partially removed, including measuring relative positional relationship between a position of a region where the dielectric film is partially removed and a position of the formed electrode in the semiconductor substrate after partially removing the dielectric film and forming the electrode, wherein for a newly prepared semiconductor substrate having a dielectric film on at least a first main surface, the dielectric film is partially removed after adjusting a position of a region based on the measured positional relationship. This improves the yield ratio of the solar cell by reducing positional displacement between the region where the dielectric film is partially removed and the electrode.


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