The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2020

Filed:

Nov. 27, 2018
Applicant:

Xilinx, Inc., San Jose, CA (US);

Inventors:

Shuxian Wu, Saratoga, CA (US);

Xiaobao Wang, Cupertino, CA (US);

Xuemei Xi, San Jose, CA (US);

Assignee:

Xilinx, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/538 (2006.01); H01L 23/00 (2006.01); H01L 25/18 (2006.01); H01L 25/04 (2014.01);
U.S. Cl.
CPC ...
H01L 23/5386 (2013.01); H01L 23/5381 (2013.01); H01L 23/5383 (2013.01); H01L 24/16 (2013.01); H01L 24/24 (2013.01); H01L 24/25 (2013.01); H01L 25/042 (2013.01); H01L 25/18 (2013.01); H01L 24/73 (2013.01); H01L 2224/16227 (2013.01); H01L 2224/24137 (2013.01); H01L 2224/73209 (2013.01); H01L 2924/1431 (2013.01); H01L 2924/1434 (2013.01); H01L 2924/1436 (2013.01);
Abstract

A die-to-die interconnect structure includes an interconnect network including a plurality of metal interconnect layers. The interconnect network is configured to electrically couple a first die and a second die mounted on a top surface of the die-to-die interconnect structure. A first metal interconnect layer of the plurality of metal interconnect layers includes a plurality of ground lines and a plurality of signal lines distributed across the first metal interconnect layer according to a GSSG pattern. In some examples, adjacent signal lines within the first metal interconnect layer are separated by a dielectric region. In some embodiments, a second metal interconnect layer of the plurality of metal interconnect layers is disposed above the first metal interconnect layer and includes a plurality of configurable signal/ground lines. By way of example, each of the plurality of configurable signal/ground lines is disposed over the dielectric region and within the second metal interconnect layer.


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