The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2020

Filed:

Jan. 07, 2016
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventor:

Hitoshi Nakai, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/02 (2006.01); B08B 3/08 (2006.01); B08B 3/10 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67023 (2013.01); B08B 3/02 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); H01L 21/02057 (2013.01); H01L 21/30604 (2013.01); H01L 21/67051 (2013.01); H01L 21/68764 (2013.01); B08B 2203/0229 (2013.01);
Abstract

In a substrate processing apparatus, a cup part is moved in an up-down direction to cause a cup exhaust port to selectively overlap a first chamber exhaust port or a second chamber exhaust port. In the state in which the cup exhaust port overlaps the first chamber exhaust port, gas in the cup part is discharged through the cup exhaust port and the first chamber exhaust port by a first exhaust mechanism. In the state in which the cup exhaust port overlaps the second chamber exhaust port, the gas in the cup part is discharged through the cup exhaust port and the second chamber exhaust port by a second exhaust mechanism. In this way, an exhaust mechanism for exhausting gas from the cup part can be easily switched between the first exhaust mechanism and the second exhaust mechanism.


Find Patent Forward Citations

Loading…