The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2020
Filed:
Aug. 22, 2016
Hangzhou Hikvision Digital Technology Co., Ltd., Hangzhou, Zhejiang, CN;
Cheng Qin, Zhejiang, CN;
Hui Mao, Zhejiang, CN;
Linjie Shen, Zhejiang, CN;
Hai Yu, Zhejiang, CN;
Shiliang Pu, Zhejiang, CN;
HANGZHOU HIKVISION DIGITAL TECHNOLOGY CO., LTD., Hangzhou, Zhejiang, CN;
Abstract
The present application discloses a method and a device for image stitching. The method includes: obtaining a first image acquired by a first camera and a second image acquired by a second camera, wherein the first image is an image with visible light information, the second image is an image including depth information and visible light information, the first camera and the second camera are disposed adjacent to each other, and there is an overlapping area between the acquired first image and second image; mapping pixels in the second image to the overlapping area and/or an extended area, wherein the extended area is an image area formed by pixels in the second image which are mapped to the outside of the first image; stitching the mapped pixels in the second image to the overlapping area and/or the extended area based on depth information and visible light information of the pixels in the second image to obtain a stitched image. The present application solves the technical problem of a low stitching efficiency in the image stitching process in the prior art.