The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2020
Filed:
Mar. 11, 2019
Toshiba Memory Corporation, Tokyo, JP;
Sachiko Kobayashi, Ota Tokyo, JP;
Toshiba Memory Corporation, Tokyo, JP;
Abstract
According to one embodiment, a sliding inhibition portion extracting method is applied to pattern formation to press an original having a pattern against a resin on a transferred object and cure the resin to transfer the pattern of the original, and extracts a sliding inhibition portion that inhibits sliding of the original in a state of being in contact with the resin before curing in a shot region that is a region in which the pattern is formed by single transfer by either a first technique of estimating the sliding inhibition portion on the basis of at least one of an uneven distribution on a surface of the transferred object, a pattern layout of the original, and a result of misalignment of a transfer pattern, changing a thickness of the resin in the shot region on the basis of the estimation, and determining whether sliding inhibition of the original occurs, or a second technique using a table indicating a relationship between a distribution of the sliding inhibition portion in the shot region and the misalignment of a transfer pattern.