The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2020
Filed:
May. 06, 2019
Raytheon Company, Waltham, MA (US);
Joseph Marron, Manhattan Beach, CA (US);
Maurice J. Halmos, Encino, CA (US);
Justin S. Grayer, Arlington Heights, IL (US);
Gamze Erten, Agoura Hills, CA (US);
David N. Sitter, Jr., Torrance, CA (US);
Raytheon Company, Waltham, MA (US);
Abstract
An apparatus includes at least one processor configured to determine a wavefront phase profile of return illumination reflected from a remote object, where the wavefront phase profile is based on interference between Doppler-shifted local oscillator (LO) illumination and the return illumination. The at least one processor is also configured to calculate a wavefront error based on a comparison between (i) the determined wavefront phase profile of the return illumination and (ii) a desired wavefront phase profile of a high energy laser (HEL) beam. The at least one processor is further configured to control a deformable mirror to at least partially compensate the HEL beam for the calculated wavefront error.