The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2020
Filed:
Mar. 06, 2018
Applicant:
Malvern Panalytical B.v., Almelo, NL;
Inventors:
Detlef Beckers, Almelo, NL;
Alexander Kharchenko, Almelo, NL;
Milen Gateshki, Almelo, NL;
Eugene Reuvekamp, Almelo, NL;
Assignee:
MALVERN PANALYTICAL B.V., Almelo, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/20091 (2018.01); G01N 23/20008 (2018.01);
U.S. Cl.
CPC ...
G01N 23/20091 (2013.01); G01N 23/20008 (2013.01); G01N 2223/0563 (2013.01); G01N 2223/315 (2013.01); G01N 2223/5015 (2013.01); G01N 2223/62 (2013.01);
Abstract
An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.