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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10752718 B1

PDFFull Text
Date of Patent:
Aug. 25, 2020

Filed:

Oct. 05, 2016

Photocurable resin composition and method of forming patterns using the same

Applicant:

Chem Optics Inc., Daejeon, KR;

Inventors:

Hyung-Jong Lee, Sejong, KR;

Nam Seob Baek, Daejeon, KR;

Jonghwi Lee, Daejeon, KR;

Yun Jung Seo, Daejeon, KR;

Hyun Jin Yoo, Daejeon, KR;

Assignee:

CHEM OPTICS INC., Daejeon, KR;

Attorney:

McCoy Russell LLP

Primary Examiner:

Robert C Dye

Assistant Examiner:

Taryn Trace Willett

Int. Cl.
CPC ...
C08F 222/18 (2006.01); C08F 220/22 (2006.01); C08F 236/16 (2006.01); C08F 2/48 (2006.01); G03F 7/027 (2006.01); G03F 7/075 (2006.01); G03F 7/004 (2006.01); C09D 135/02 (2006.01); G03F 7/00 (2006.01); G03F 7/031 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
C08F 222/18 (2013.01); C08F 2/48 (2013.01); C08F 220/22 (2013.01); C08F 236/16 (2013.01); C09D 135/02 (2013.01); G03F 7/0002 (2013.01); G03F 7/0046 (2013.01); G03F 7/027 (2013.01); G03F 7/031 (2013.01); G03F 7/0755 (2013.01); G03F 7/162 (2013.01); G03F 7/2004 (2013.01);
Abstract

The present invention relates to a photocurable resin composition usable in a nanoimprint process which is capable of overcoming low productivity of conventional semiconductor processes for optical devices and electronic devices, and a method of forming patterns using the same. Specifically, the present invention relates to a photocurable resin composition including a specific perfluorinated acrylic compound for improving release property between a nanoimprint mold and the photocurable resin composition, and a method of forming patterns using the same.

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