The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2020

Filed:

Mar. 27, 2017
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Kang Soo Han, Seoul, KR;

Moonjung An, Hwaseong-si, KR;

Gugrae Jo, Asan-si, KR;

Hyungbin Cho, Seongnam-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 69/00 (2006.01); G03F 7/00 (2006.01); B29C 59/02 (2006.01); B29C 33/38 (2006.01);
U.S. Cl.
CPC ...
B29C 69/001 (2013.01); B29C 33/3842 (2013.01); B29C 59/02 (2013.01); G03F 7/0002 (2013.01); B29C 2059/027 (2013.01); B29C 2793/0027 (2013.01);
Abstract

A method of manufacturing an imprint master template including forming a cutting line guide at an edge of a first fine pattern unit having an upper surface on which a fine pattern is formed; cutting a wafer substrate by a cleaving process along the cutting line guide so that a cutting surface is formed, the cutting surface having a preliminary second surface where the cutting line guide was formed and a first surface which is formed by the cleaving process; polishing the preliminary second surface to form a second surface which is inclined at a predetermined angle with respect to the first surface; and bonding the first fine pattern unit and the second fine pattern unit to each other with the first surface of the first fine pattern unit facing the first surface of the second fine pattern unit.


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