The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2020

Filed:

Mar. 07, 2016
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Tsutomu Terao, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/00 (2006.01); G03F 7/00 (2006.01); B29C 59/02 (2006.01); B29C 37/00 (2006.01);
U.S. Cl.
CPC ...
B29C 59/002 (2013.01); B29C 59/02 (2013.01); G03F 7/0002 (2013.01); B29C 2037/90 (2013.01); B29C 2037/903 (2013.01); B29C 2037/906 (2013.01); B29C 2059/023 (2013.01);
Abstract

The present invention an imprint apparatus which performs an imprint process of forming a pattern in an imprint material on a substrate using a mold, the apparatus including an image capturing unit configured to obtain an image by capturing the substrate, and a processing unit configured to perform detection processing of detecting a foreign particle present between the mold and the substrate, wherein the processing unit performs the detection processing by comparing, with a reference image, an image obtained by the image capturing unit in a state in which the mold and the imprint material on the substrate are in contact with each other, and when the image includes a region outside the substrate, the region outside the substrate is excluded from a target of the detection processing.


Find Patent Forward Citations

Loading…