The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2020

Filed:

Nov. 23, 2016
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Hiroshi Sato, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 43/58 (2006.01); G03F 7/00 (2006.01); G03F 9/00 (2006.01); B29C 43/02 (2006.01); B29C 43/36 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
B29C 43/58 (2013.01); B29C 43/021 (2013.01); G03F 7/0002 (2013.01); G03F 9/7042 (2013.01); B29C 2043/025 (2013.01); B29C 2043/3602 (2013.01); B29C 2043/585 (2013.01); B29C 2043/5833 (2013.01); G03F 7/7085 (2013.01); G03F 9/7069 (2013.01); G03F 9/7073 (2013.01); G03F 9/7076 (2013.01); G03F 9/7084 (2013.01); G03F 9/7088 (2013.01);
Abstract

An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold includes a plurality of alignment scopes and a control unit. The control unit controls aligning of a shot region of the substrate and the mold based on outputs from the plurality of alignment scopes. Each of the plurality of alignment scopes outputs information indicating a relative position of a first mark selected from a plurality of first marks in the shot region and a second mark selected from a plurality of second marks on the mold. The control unit controls aligning of the shot region and the mold based on information excluding incorrect information from a plurality of pieces of information output from the plurality of alignment scopes.


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