The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2020

Filed:

Mar. 06, 2017
Applicant:

Desktop Metal, Inc., Burlington, MA (US);

Inventors:

Emanuel Michael Sachs, Newton, MA (US);

Richard Remo Fontana, Cape Elizabeth, ME (US);

Assignee:

Desktop Metal, Inc., Burlington, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B33Y 10/00 (2015.01); B22F 3/115 (2006.01); B22F 3/00 (2006.01); B33Y 30/00 (2015.01); B33Y 50/02 (2015.01); B05B 5/025 (2006.01);
U.S. Cl.
CPC ...
B22F 3/115 (2013.01); B05B 5/025 (2013.01); B22F 3/008 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12); B22F 2999/00 (2013.01);
Abstract

Devices, systems, and methods are directed to applying magnetohydrodynamic forces to liquid metal to eject liquid metal along a controlled pattern, such as a controlled three-dimensional pattern as part of additive manufacturing of an object. An electric current delivered to produce the magnetohydrodynamic forces can be controlled between a pulsed electric current and a direct electric current to change the rate of liquid metal ejection from a nozzle. For example, the electric current can be switched between a pulsed electric current and a direct electric current based at least in part on a position of the nozzle along the controlled pattern, providing accuracy of liquid metal deposition along portions of the pattern having more detail and providing speed of liquid metal deposition along portions of the pattern having less detail.


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