The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2020
Filed:
Apr. 15, 2016
Covestro Llc, Pittsburgh, PA (US);
Covestro Polymers (China) Co. Ltd., Shanghai, CN;
Amber Rogers Hicks, Manvel, TX (US);
William A. Hassell, Seabrook, TX (US);
Kevin M. Kelleher, Houston, TX (US);
Kent Swart, Dayton, TX (US);
Wingwah Lau, Houston, TX (US);
Bin Tang, Shanghai, CN;
Norbert Steindel, Leverkusen, DE;
Covestro LLC, Pittsburgh, PA (US);
Covestro Polymers (China) Co., Ltd., Shanghai, CN;
Abstract
The present invention provides a new type of filtration system. Traditional designs required that personnel open the system to clean/change strainers while a process was in operation. This invention provides a straining system that allows process stream to be filtered in a manner completely internal to the process. The system includes dual strainers with a nitrogen purging system and solvent flush system. A creatively designed 'catch' area is installed internal to the process to collect all solids that are flushed from the strainer system. The system remains completely closed for the duration of each production campaign, thus eliminating the safety hazard and labor requirement associated with opening a process system.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile