The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2020
Filed:
Mar. 12, 2018
Applicant:
General Electric Company, Schenectady, NY (US);
Inventors:
Wanming Zhang, Clifton Park, NY (US);
Min Zou, Niskayuna, NY (US);
Francis Johnson, Clifton Park, NY (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01F 1/14 (2006.01); H01F 1/147 (2006.01); H01F 41/02 (2006.01); H02K 1/02 (2006.01); H02K 1/06 (2006.01); H02K 15/02 (2006.01); H02K 1/24 (2006.01); H01F 1/18 (2006.01); H01F 3/02 (2006.01); H01F 3/10 (2006.01);
U.S. Cl.
CPC ...
H01F 1/147 (2013.01); H01F 1/18 (2013.01); H01F 3/02 (2013.01); H01F 41/02 (2013.01); H01F 41/0233 (2013.01); H02K 1/02 (2013.01); H02K 1/06 (2013.01); H02K 1/246 (2013.01); H02K 15/02 (2013.01); H01F 2003/106 (2013.01);
Abstract
A method of forming a component having a variation in saturation magnetization is presented. The method includes selectively diffusing nitrogen into a metallic component of a masked metallic component by exposing the masked metallic component to a nitrogen-rich atmosphere. The masked metallic component includes a patterned oxide layer formed on a surface of the metallic component, and the patterned oxide layer includes an oxide of a metal present in the metallic component. A related component is also presented.