The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2020

Filed:

Dec. 21, 2016
Applicant:

Emc Ip Holding Company Llc, Hopkinton, MA (US);

Inventors:

Jehuda Shemer, Kfar Saba, IL;

Assaf Natanzon, Tel Aviv, IL;

Leehod Baruch, Rishon Leziyon, IL;

Ron Bigman, Holon, IL;

Amit Lieberman, Raanana, IL;

Assignee:

EMC IP Holding Company LLC, Hopkinton, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 11/07 (2006.01); G06Q 10/06 (2012.01); G06F 11/30 (2006.01); G06F 3/06 (2006.01); H04L 29/06 (2006.01);
U.S. Cl.
CPC ...
G06F 11/0793 (2013.01); G06F 3/0647 (2013.01); G06F 11/0709 (2013.01); G06F 11/079 (2013.01); G06F 11/0754 (2013.01); G06F 11/3055 (2013.01); G06Q 10/0635 (2013.01); G06F 3/0646 (2013.01); G06F 11/3006 (2013.01); H04L 63/1433 (2013.01); H04L 63/1441 (2013.01);
Abstract

A computer-implemented method is provided. First information is received from at least a first data source. Based at least in part on analysis of the received first information, a determination of a first risk of a first adverse event is made, the risk affecting a first entity associated with a first location. Based at least in part on the first risk, at least a first impact from the first adverse event on the first entity is determined. At least a first action is dynamically caused to occur either before the completion of the first adverse event, the first action configured to substantially mitigate the first impact.


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