The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2020

Filed:

Jan. 26, 2017
Applicants:

Fraunhofer-gesellschaft Zur Förderung Der Angewandten Forschung E.v., Munich, DE;

Westsächsische Hochschule Zwickau, Zwickau, DE;

Inventors:

Peter Hartmann, Greiz, DE;

Tobias Baselt, Zwickau, DE;

Alexander Kabardiadi, Zwickau, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 9/00 (2006.01); G01J 1/04 (2006.01); G01J 1/42 (2006.01);
U.S. Cl.
CPC ...
G01J 9/00 (2013.01); G01J 1/0455 (2013.01); G01J 1/4257 (2013.01); G01J 2009/002 (2013.01);
Abstract

The present invention relates to an arrangement and to a method for wavefront analysis comprising a radiation source () that emits an electromagnetic wavefront of electromagnetic radiation () to be analyzed; a spatially resolving detector unit () for detecting the electromagnetic wavefront; and an electronic evaluation unit () connected to the detector unit (). The at least one beam guidance unit () for guiding the electromagnetic radiation (), that is only diffractive and/or reflective, has at least one opening () and the detector unit () is arranged behind the at least one opening () of the beam guidance unit () in the direction of propagation of the electromagnetic radiation () for detecting a diffraction pattern of the electromagnetic radiation () diffracted at the at least one opening ().


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