The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2020
Filed:
Jan. 10, 2019
V-tex Corporation, Shinagawa-ku, Tokyo, JP;
Hideaki Nagai, Hitachinaka, JP;
Tomohiro Sawahata, Hitachinaka, JP;
Katsuyuki Saitoh, Hitachinaka, JP;
Shuichi Araki, Hitachinaka, JP;
Yoshinori Tobita, Hitachinaka, JP;
Mitsuhiro Ikeda, Hitachinaka, JP;
V-Tex Corporation, Tokyo, JP;
Abstract
Particle scattering is suppressed only by controlling the gate valve in opening the gate valve with the internal pressure of the chamber being matched to the atmospheric pressure. A method of controlling a gate valve is characterized in that, in a gate valve that presses its valve body to an opening of a chamber by detecting a torque of a motor that drives the valve body, the method comprises the following steps: acquiring in advance a local maximum of the torque at the time of decompressing the inside of the chamber with the valve body closed under the atmospheric pressure, detecting the torque when a vent gas is being introduced into the chamber before returning the inside of the chamber to the atmospheric pressure for opening the valve body, opening the valve body when the torque exceeds the local maximum of the torque so that a clearance is created between the valve body and the opening of the chamber, and opening fully the valve body after the particles are discharged together with the gas inside the chamber.