The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2020
Filed:
Jul. 27, 2017
Samsung Display Co., Ltd., Yongin-si, Gyeonggi-do, KR;
Heemin Yoo, Yongin-si, KR;
Yeonjoo Seo, Yongin-si, KR;
Dahye Yoon, Yongin-si, KR;
Hyunsup Yoon, Yongin-si, KR;
Jungwoon Jung, Yongin-si, KR;
Sungchan Jo, Yongin-si, KR;
Kyunglae Rho, Yongin-si, KR;
Sungwook Woo, Yongin-si, KR;
Sooim Jeong, Yongin-si, KR;
SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;
Abstract
A method of preparing a patterned cured product, the method including: providing a composition including a sol-gel reactive silicon-containing monomer, a polymerizable (meth)acryl monomer, a photoinitiator, and a fluorinating agent on a substrate to form a first layer on the substrate; contacting the first layer with a master mold to form a second layer including a pattern transferred by the master mold; and obtaining the patterned cured product from the second layer, wherein obtaining of the patterned cured product from the second layer includes a sol-gel reaction, a photocuring reaction, and a separating of the master mold.