The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2020

Filed:

Feb. 01, 2019
Applicant:

Mitsubishi Heavy Industries, Ltd., Tokyo, JP;

Inventor:

Hitoshi Yoshimura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 67/00 (2017.01); B22F 3/10 (2006.01); B22F 3/16 (2006.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B22F 3/105 (2006.01); B29C 64/153 (2017.01); B23P 23/04 (2006.01);
U.S. Cl.
CPC ...
B22F 3/1007 (2013.01); B22F 3/1055 (2013.01); B22F 3/16 (2013.01); B23P 23/04 (2013.01); B29C 64/153 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B22F 2003/1056 (2013.01); Y02P 10/295 (2015.11);
Abstract

Provided is a three-dimensional deposition device, including: a powder supply unit which supplies a powder material; a light irradiation unit which irradiates the powder material with a light beam so that the powder material irradiated with the light beam is sintered or melted and solidified to form a formed layer; a three-dimensional deposition chamber which is sealed from an outside and accommodates the powder supply unit, the light irradiation unit, and a base unit; a gas discharge unit which discharges a gas inside the three-dimensional deposition chamber; and a gas introduction unit which introduces a predetermined gas into the three-dimensional deposition chamber. When the gas discharge unit discharges a gas inside the three-dimensional deposition chamber and the gas introduction unit introduces a predetermined gas thereinto, a predetermined gas atmosphere is formed inside the three-dimensional deposition chamber.


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