The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2020

Filed:

Sep. 11, 2019
Applicant:

Eth Zürich, Zürich, CH;

Inventors:

Duane Edward Hudgins, Zürich, CH;

Reza Shokrollah Abhari, Zürich, CH;

Assignee:

ETH ZÜRICH, Zürich, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); H05G 2/006 (2013.01);
Abstract

The invention relates to a method for generating electromagnetic radiation by a laser-produced plasma, wherein a target comprising a target material is provided, at least one pulse sequence is directed to said target, wherein the pulse sequence comprises four to nine conditioning laser pulses, wherein time intervals between subsequent conditioning laser pulses are 200 ns or less, and a main laser pulse is directed to said target along a first axis, such that a radiation-emitting plasma is formed from at least a part of said target material. The invention further relates to a device for generating electromagnetic radiation by means of a laser-produced plasma comprising a dispensing device and at least one laser source, wherein the device is configured such that at least one pulse sequence comprising four to nine conditioning laser pulses and a main laser pulse can be generated by the at least one laser source.


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