The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2020

Filed:

Dec. 05, 2018
Applicant:

Lg Display Co., Ltd., Seoul, KR;

Inventors:

Jiyong Noh, Paju-si, KR;

Jaeman Jang, Paju-si, KR;

JuHeyuck Baeck, Paju-si, KR;

PilSang Yun, Paju-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 29/24 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01); H01L 21/38 (2006.01); G02F 1/1368 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78696 (2013.01); H01L 21/02422 (2013.01); H01L 21/02472 (2013.01); H01L 21/02483 (2013.01); H01L 21/02491 (2013.01); H01L 21/02505 (2013.01); H01L 21/02554 (2013.01); H01L 21/02565 (2013.01); H01L 21/02631 (2013.01); H01L 29/247 (2013.01); H01L 29/66969 (2013.01); H01L 29/78693 (2013.01); G02F 1/1368 (2013.01); G02F 2001/13685 (2013.01); H01L 21/02488 (2013.01); H01L 21/02592 (2013.01); H01L 21/38 (2013.01); H01L 27/3244 (2013.01); H01L 29/78633 (2013.01);
Abstract

A thin film transistor is provided. The thin film transistor includes an oxide semiconductor layer on a substrate, a gate electrode insulated from the oxide semiconductor layer to overlap at least a portion of the oxide semiconductor layer, a source electrode connected to the oxide semiconductor layer, and a drain electrode spaced apart from the source electrode and connected to the oxide semiconductor layer. The oxide semiconductor layer includes a first oxide semiconductor layer on the substrate and a second oxide semiconductor layer on the first oxide semiconductor layer, the first oxide semiconductor layer includes nitrogen of 1 at % to 5 at % concentration with respect to number of atoms, and the second oxide semiconductor layer has a nitrogen concentration which is lower than a nitrogen concentration of the first oxide semiconductor layer and a gradient of the nitrogen concentration such that the nitrogen concentration is lowered in a direction closer to the gate electrode.


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