The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2020

Filed:

Apr. 01, 2019
Applicant:

Orthogonal, Inc., Rochester, NY (US);

Inventors:

Charles Warren Wright, Fairport, NY (US);

Douglas Robert Robello, Webster, NY (US);

John Andrew Defranco, Rochester, NY (US);

Diane Carol Freeman, Pittsford, NY (US);

Frank Xavier Byrne, Webster, NY (US);

Assignee:

Orthogonal, Inc., Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/40 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); H01L 21/027 (2006.01); C08F 220/34 (2006.01); G03F 7/004 (2006.01); G03F 7/075 (2006.01); H01L 21/3105 (2006.01); H01L 21/311 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0388 (2013.01); C08F 220/34 (2013.01); G03F 7/0046 (2013.01); G03F 7/0048 (2013.01); G03F 7/038 (2013.01); G03F 7/0758 (2013.01); G03F 7/11 (2013.01); G03F 7/20 (2013.01); G03F 7/30 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); H01L 21/3105 (2013.01); H01L 21/31055 (2013.01); H01L 21/31127 (2013.01);
Abstract

A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.


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