The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2020
Filed:
Dec. 22, 2017
Fujifilm Corporation, Tokyo, JP;
Hirotaka Kitagawa, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are a photocurable composition capable of suppressing both deformation (change in line width roughness (ΔLWR)) of a pattern after etching and breakage of a pattern after etching, a pattern forming method, and a method for manufacturing a device. Disclosed is a photocurable composition including a monofunctional (meth)acrylate represented by the following General Formula (I) and a photopolymerization initiator, where Rrepresents a hydrogen atom or a methyl group; Rrepresents an alkyl group which may be substituted with a fluorine atom, Rrepresents a hydrogen atom, a linear alkyl group which may be substituted with a fluorine atom, or a branched alkyl group which may be substituted with a fluorine atom, Rto Reach independently represent a hydrogen atom, a halogen atom, a linear alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 or 4 carbon atoms, the total number of carbon atoms included in Rand Ris 1 to 6, and Rand R, or Rand Rmay be bonded to each other and form a ring.