The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2020
Filed:
Oct. 31, 2017
Boe Technology Group Co., Ltd., Beijing, CN;
Ordos Yuansheng Optoelectronics Co., Ltd., Ordos, Inner Mongolia, CN;
Zhiming Lin, Beijing, CN;
Zhen Wang, Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., Ordos, Innter Mongolia, CN;
Abstract
A method of preparing a mask, a mask and an evaporation system are provided. The mask includes a frame having an opening in a middle region thereof and a mask pattern disposed above the frame. The method of preparing the mask includes: applying first opposite forces to the frame during a molding process of the frame; applying second opposite forces to the frame, during a welding process when the mask pattern is welded to at least part of the frame to cover an inner opening region of the frame; wherein the first opposite forces and the second opposite forces are equal in magnitude and the same in direction.