The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2020

Filed:

Aug. 31, 2017
Applicant:

Shanghai United Imaging Healthcare Co., Ltd., Shanghai, CN;

Inventors:

Chaohong Wang, Shanghai, CN;

Guobin Li, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 33/54 (2006.01); G01R 33/561 (2006.01); A61B 5/055 (2006.01); G01R 33/48 (2006.01); G01R 33/28 (2006.01);
U.S. Cl.
CPC ...
G01R 33/543 (2013.01); A61B 5/055 (2013.01); G01R 33/5617 (2013.01); G01R 33/288 (2013.01); G01R 33/4808 (2013.01);
Abstract

A method may include providing an initial flip angle schedule of refocusing radio frequency pulses, the refocusing radio frequency pulses being configured to generate an echo train; comparing the initial flip angle schedule with a first criterion, the first criterion relating to a first parameter relating to the echo train; determining, a first flip angle schedule based on the first comparison, the first flip angle schedule satisfying the first criterion; comparing the first flip angle schedule with a second criterion, the second criterion relating to a second parameter relating to the echo train; determining, a second flip angle schedule based on the second comparison, the second flip angle schedule satisfying the second criterion; and obtaining a magnetic resonance (MR) signal based on the second flip angle schedule.


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