The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2020

Filed:

Aug. 24, 2017
Applicant:

Korea Institute of Science and Technology, Seoul, KR;

Inventors:

Kwan Hyi Lee, Seoul, KR;

Minhong Jeun, Seoul, KR;

Seok Lee, Seoul, KR;

Sang Kyung Kim, Seoul, KR;

Sungwook Park, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/45 (2006.01); G01N 27/414 (2006.01);
U.S. Cl.
CPC ...
G01N 27/414 (2013.01); G01N 27/4145 (2013.01); H01L 29/458 (2013.01);
Abstract

Provided is a field-effect transistor that can reduce noise, be produced by a simplified manufacturing method, and also have a plurality of active patterns and gate patterns designed to be combinable according to a detection purpose. The field-effect transistor includes a lower silicon layer and a buried oxide layer disposed on the lower silicon layer; an active pattern disposed on the buried oxide layer and including a channel region, a source region, and a drain region; a gate pattern disposed on the active pattern to at least partially overlap the active pattern; a source electrode disposed in direct contact with the source region on the active pattern, and a drain electrode disposed in direct contact with the drain region on the active pattern; and a gate insulating film disposed between the active pattern and the gate pattern.


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