The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2020

Filed:

Apr. 07, 2016
Applicant:

Chemetall Gmbh, Frankfurt, DE;

Inventors:

Olaf Dahlenburg, Neu-Isenburg, DE;

Frank Hollmann, Leutkirch, DE;

Lisa Schmeier, Freigericht-Bernbach, DE;

Assignee:

Chemetall GmbH, Frankfurt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 22/83 (2006.01); C23C 22/40 (2006.01); C23C 22/18 (2006.01); C23C 22/36 (2006.01); C25D 13/12 (2006.01); C25D 13/20 (2006.01); C23C 22/34 (2006.01); C25D 5/48 (2006.01); C23C 22/07 (2006.01); C23C 22/82 (2006.01); C23C 22/00 (2006.01);
U.S. Cl.
CPC ...
C23C 22/83 (2013.01); C23C 22/07 (2013.01); C23C 22/182 (2013.01); C23C 22/34 (2013.01); C23C 22/362 (2013.01); C23C 22/364 (2013.01); C23C 22/365 (2013.01); C23C 22/82 (2013.01); C25D 5/48 (2013.01); C25D 13/12 (2013.01); C25D 13/20 (2013.01); C23C 2222/20 (2013.01);
Abstract

Described herein is a method for substantially nickel-free phosphating of a metallic surface, wherein a metallic surface, optionally after cleaning and/or activation, is first treated with an acidic aqueous phosphating composition that includes zinc ions, manganese ions, and phosphate ions, and is optionally rinsed and/or dried, and is thereafter treated with an aqueous after-rinse composition that includes at least one kind of metal ion selected from the group consisting of the ions of molybdenum, copper, silver, gold, palladium, tin, antimony, titanium, zirconium, and hafnium and/or at least one polymer selected from the group consisting of the polymer classes of the polyamines, polyethyleneamines, polyanilines, polyimines, polyethyleneimines, polythiophenes, and polypryroles and also mixtures and copolymers thereof, with both the phosphating composition and the after-rinse composition being substantially nickel-free.


Find Patent Forward Citations

Loading…