The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2020
Filed:
Apr. 20, 2018
Xerox Corporation, Norwalk, CT (US);
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Naveen Chopra, Oakville, CA;
Warren Jackson, San Francisco, CA (US);
Steven E. Ready, Los Altos, CA (US);
Xerox Corporation, Norwalk, CT (US);
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Abstract
A method for creating controlled scattering effects including (a) disposing at least one curable ink layer onto a substrate in an imagewise fashion or in a continuous film fashion; (b) applying a first cure to partially cure the ink layer (a); (c) disposing at least one scattering material onto the ink layer (a); and (d) applying a second cure to fully cure the ink layer (a); wherein the first cure and the second cure are applied in a manner to control the disposition of the scattering material on top of and penetration into the curable ink layer to control surface and subsurface scattering properties.