The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2020
Filed:
Sep. 18, 2014
Applicant:
Microcontinuum, Inc., Cambridge, MA (US);
Inventor:
W. Dennis Slafer, Arlington, MA (US);
Assignee:
MicroContinuum, Inc., Watertown, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 59/02 (2006.01); B29C 59/00 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
B29C 59/002 (2013.01); B29C 59/022 (2013.01); H01L 51/0023 (2013.01); B29C 2059/023 (2013.01); B29K 2905/00 (2013.01); B29K 2995/0026 (2013.01);
Abstract
Means, apparatus, systems, and/or methods are described for forming improved rigid or flexible semi-transparent imprinting templates. These templates can be used to produce patterning masks having improved resolution that do not require plasma etching for residue removal. The methods and apparatus are compatible with roll-to-roll manufacturing processes and enable roll-to-roll formation of a wide range of metal patterned films.
Slafer, W.. (2020). Tools and methods for forming semi-transparent patterning masks (U.S. Patent No. 10737433). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10737433
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile