The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2020
Filed:
Jun. 19, 2019
Applicant:
Sumitomo Chemical Company, Limited, Tokyo, JP;
Inventors:
Mikio Takigawa, Niihama, JP;
Toshiyuki Terasawa, Tokyo, JP;
Assignee:
SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01); B23K 20/02 (2006.01);
U.S. Cl.
CPC ...
B23K 20/023 (2013.01); C23C 14/34 (2013.01); C23C 14/3407 (2013.01); C23C 14/3414 (2013.01); H01J 37/3417 (2013.01); H01J 37/3426 (2013.01); H01J 37/3435 (2013.01); H01J 37/3491 (2013.01);
Abstract
A process for producing a sputtering target in which a target material is diffusion-bonded to a top face of a backing plate material, the process comprising: a step of heating the top face of the target material by a hot plate while pressing from above thereby diffusion-bonding the target material to the backing plate material in such a manner that the step is performed at a center part prior to an outer peripheral part of the top face.