The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2020

Filed:

Oct. 09, 2018
Applicant:

Shanghai Neusoft Medical Technology Co., Ltd., Shanghai, CN;

Inventors:

Han Xu, Shenyang, CN;

Zhichao Jiang, Shenyang, CN;

Lin Zhang, Shenyang, CN;

Ming Li, Shenyang, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/10 (2006.01);
U.S. Cl.
CPC ...
A61N 5/1075 (2013.01); A61N 5/1049 (2013.01); A61N 2005/1054 (2013.01); A61N 2005/1056 (2013.01); A61N 2005/1076 (2013.01);
Abstract

Methods and devices for detecting consistency between an invisible radiation field and a visible light field are provided. In an example, the method includes: an invisible radiation field is obtained by controlling a size of an opening of a beam limiting device; a first projection image is captured by an Electron Portal Imaging Device (EPID) as a distribution map of the invisible radiation field; a visible light field is obtained by turning on a light field lamp without changing the size of the opening of the beam limiting device; a phantom is positioned at each of vertices of the visible light field; a second projection image is captured by the EPID as a vertex distribution map of the visible light field; and deviation information between the invisible radiation field and the visible light field is determined according to the distribution map of the invisible radiation field and the vertex distribution map of the visible light field.


Find Patent Forward Citations

Loading…