The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

Jan. 15, 2019
Applicant:

Semiconductor Energy Laboratory Co., Ltd., Atsugi-shi, Kanagawa-ken, JP;

Inventors:

Hiroki Komagata, Atsugi, JP;

Naoki Okuno, Sagamihara, JP;

Yutaka Okazaki, Isehara, JP;

Hiroshi Fujiki, Kudamatsu, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 29/20 (2006.01); H01L 29/423 (2006.01); H01L 29/786 (2006.01); H01L 29/221 (2006.01); H01L 29/10 (2006.01); H01L 29/66 (2006.01); H01L 29/778 (2006.01); H01L 29/24 (2006.01);
U.S. Cl.
CPC ...
H01L 29/2006 (2013.01); H01L 29/1079 (2013.01); H01L 29/221 (2013.01); H01L 29/42364 (2013.01); H01L 29/42384 (2013.01); H01L 29/66969 (2013.01); H01L 29/7869 (2013.01); H01L 29/78609 (2013.01); H01L 29/78648 (2013.01); H01L 29/78693 (2013.01); H01L 29/24 (2013.01); H01L 29/7782 (2013.01);
Abstract

A semiconductor device with a high on-state current is provided. The semiconductor device includes a first insulator over a substrate, an oxide over the first insulator, a second insulator over the oxide, a conductor overlapping with the oxide with the second insulator therebetween, a third insulator in contact with a top surface of the oxide, a fourth insulator in contact with a top surface of the third insulator, a side surface of the second insulator, and a side surface of the conductor, and a fifth insulator in contact with a side surface of the fourth insulator, a side surface of the third insulator, and the top surface of the oxide. The third insulator has a lower oxygen permeability than the fourth insulator.


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