The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

Aug. 19, 2019
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventors:

Takeshi Okagaki, Tokyo, JP;

Koji Shibutani, Tokyo, JP;

Makoto Yabuuchi, Tokyo, JP;

Nobuhiro Tsuda, Tokyo, JP;

Assignee:

Renesas Electronics Corporation, Koutou-ku, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/02 (2006.01); H01L 27/092 (2006.01); G06F 30/394 (2020.01); H01L 29/417 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0207 (2013.01); G06F 30/394 (2020.01); H01L 27/0924 (2013.01); H01L 29/41791 (2013.01);
Abstract

An area of a semiconductor device having a FINFET can be reduced. The drain regions of an n-channel FINFET and a p-channel FINFET are extracted by two second local interconnects from a second Y gird between a gate electrode and a dummy gate adjacent thereto, to a third Y grid adjacent to the second Y gird. These second local interconnects are connected by a first local interconnect extending in the X direction in the third Y grid. According to such a cell layout, although the number of grids is increased by one because of the arrangement of the first local interconnect, the length in the X direction can be reduced. As a result, the cell area of the unit cell can be reduced while a space between the first and second local interconnects is secured.


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