The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
Sep. 10, 2014
Applicant:
Heraeus Quarzglas Gmbh & Co. KG, Hanau, DE;
Inventors:
Klaus Becker, Hanau, DE;
Stephan Thomas, Großkrotzenburg, DE;
Assignee:
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); C03C 3/06 (2006.01); G02B 7/00 (2006.01); C03B 32/00 (2006.01); G02B 5/08 (2006.01); C03B 19/14 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70958 (2013.01); C03B 19/1415 (2013.01); C03B 19/1453 (2013.01); C03B 32/00 (2013.01); C03C 3/06 (2013.01); G02B 5/0891 (2013.01); G02B 7/008 (2013.01); C03B 2201/12 (2013.01); C03B 2201/23 (2013.01); C03B 2201/42 (2013.01); C03C 2201/42 (2013.01);
Abstract
A substrate for an EUV mirror which contains a zero crossing temperature profile that departs from the statistical distribution is provided. A method for producing a substrate for an EUV mirror is also provided, in which the zero crossing temperature profile in the substrate is adapted to the operating temperature of the mirror. A lithography method using the substrate is also described.