The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
Jan. 10, 2018
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, Gyeonggi-do, KR;
Inventors:
Shinhyo Bae, Suwon-si, KR;
Soonhyung Kwon, Suwon-si, KR;
Hyeon Park, Suwon-si, KR;
Jaeyeol Baek, Suwon-si, KR;
Beomjun Joo, Suwon-si, KR;
Yoojeong Choi, Suwon-si, KR;
Kwen-Woo Han, Suwon-si, KR;
Assignee:
SAMSUNG SDI CO., LTD., Yongin-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08G 63/20 (2006.01); G03F 7/09 (2006.01); H01L 21/308 (2006.01); C08G 59/42 (2006.01); G03F 7/039 (2006.01); C08G 59/24 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08G 59/245 (2013.01); C08G 59/4238 (2013.01); C08G 63/20 (2013.01); G03F 7/0392 (2013.01); G03F 7/091 (2013.01); G03F 7/092 (2013.01); G03F 7/094 (2013.01); H01L 21/3081 (2013.01); H01L 21/3088 (2013.01);
Abstract
A resist underlayer composition and a method of forming patterns using the resist underlayer composition, the resist underlayer composition including a polymer including a moiety represented by Chemical Formula 1 and a moiety represented by Chemical Formula 2, and a solvent,