The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

Apr. 19, 2018
Applicant:

Leica Microsystems Cms Gmbh, Wetzlar, DE;

Inventors:

Christian Schulz, Solms-Albshausen, DE;

Christian Schumann, Lich, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/02 (2006.01); G02B 7/10 (2006.01); G02B 9/34 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
G02B 21/025 (2013.01); G02B 7/10 (2013.01); G02B 9/34 (2013.01); G02B 21/02 (2013.01); G02B 27/0025 (2013.01); G02B 27/0037 (2013.01);
Abstract

An immersion objective lens for a microscope includes a first lens group having positive refractive power, a second lens group having positive refractive power, a third lens group having negative refractive power and a fourth lens group having positive refractive power disposed in this sequence from the object side. The second lens group is moveable along an optical axis so as to achieve a corrective effect with respect to a spherical aberration, such that a sum of a distance between the second lens group and the first lens group and of a distance between the second lens group and the third lens group is constant. The corrective effect of the second lens group is predetermined such that the spherical aberration is minimized for a light incidence that corresponds to a mean numerical aperture that lies between zero and a nominal aperture of the immersion objective lens.


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