The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

Aug. 19, 2014
Applicant:

AK Optics Technology Co., Ltd., Beijing, CN;

Inventors:

Jianpeng Liu, Beijing, CN;

Tang Zhang, Beijing, CN;

Chengmin Li, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/245 (2006.01); G01N 21/956 (2006.01); G01B 11/255 (2006.01); H01L 21/66 (2006.01); G01N 21/95 (2006.01); H01L 33/00 (2010.01); H01L 33/20 (2010.01);
U.S. Cl.
CPC ...
G01B 11/245 (2013.01); G01B 11/255 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01); H01L 22/12 (2013.01); H01L 22/30 (2013.01); H01L 33/005 (2013.01); H01L 33/20 (2013.01); G01B 2210/56 (2013.01);
Abstract

A device for detecting a two-dimensional morphology of a wafer substrate in real time. The device comprises: a first calculation module, a second calculation module and an analysis module, wherein the first calculation module calculates the curvature Cbetween any two points of incidence on the wafer substrate in an X direction of a substrate to be detected according to position signals of N light spots; the second calculation module calculates the curvature Cat any one point of incidence on the wafer substrate in a moving direction, i.e. a Y direction, of the substrate to be detected according to the position signals of N light spots. The device can be adapted to a sapphire substrate on a graphite disc which rotates at a high speed.


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