The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

May. 08, 2019
Applicant:

China University of Mining and Technology, Beijing, Beijing, CN;

Inventors:

Yang Ju, Beijing, CN;

Chang Lu, Beijing, CN;

Peng Liu, Beijing, CN;

Zhangyu Ren, Beijing, CN;

Hongbin Liu, Beijing, CN;

Xiaolan Li, Beijing, CN;

Changbing Wan, Beijing, CN;

Xiaodong Nie, Beijing, CN;

Yating Wang, Beijing, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01B 5/30 (2006.01); G01B 5/00 (2006.01); G01N 3/08 (2006.01);
U.S. Cl.
CPC ...
G01B 5/30 (2013.01); G01B 5/0004 (2013.01); G01N 3/08 (2013.01);
Abstract

A transparent constraint apparatus for the normal deformation of a planar model, including rigid transparent retainer plates, a planar model, and magnetic force components. The magnetic force components are provided at edge positions of the rigid transparent retainer plates; the normal direction of the planar model is parallel to the normal direction of the two rigid transparent retainer plates, and said two retainer plates are symmetrically arranged relative to the plane of symmetry of the planar model; the magnetic force components are symmetrically arranged relative to the plane of symmetry of the planar model, mutually symmetrical magnetic force components producing mutually attractive magnetic force. The transparent constraint apparatus solves the problem of constraining the normal deformation of a planar model under planar-strain conditions during testing.


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