The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
Jan. 20, 2017
Applicant:
Dow Global Technologies Llc, Midland, MI (US);
Inventors:
Qi Jiang, Shanghai, CN;
Xin Jiang, Shanghai, CN;
Hua Ren, Shanghai, CN;
Eungkyu Kim, Midland, MI (US);
Jianhai Mu, Shanghai, CN;
Kaoru Ohba, Tokyo, JP;
Assignee:
Dow Global Technologies LLC, Midland, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); C11D 7/34 (2006.01); C11D 7/26 (2006.01); C11D 7/50 (2006.01); C11D 11/00 (2006.01); G03F 7/42 (2006.01); C11D 3/43 (2006.01); C11D 3/34 (2006.01); C11D 3/36 (2006.01); C11D 3/20 (2006.01); C11D 3/32 (2006.01); C11D 3/28 (2006.01);
U.S. Cl.
CPC ...
C11D 7/5009 (2013.01); C11D 3/2068 (2013.01); C11D 3/28 (2013.01); C11D 3/32 (2013.01); C11D 3/3445 (2013.01); C11D 3/362 (2013.01); C11D 3/43 (2013.01); C11D 7/5013 (2013.01); C11D 7/5022 (2013.01); C11D 11/0047 (2013.01); G03F 7/425 (2013.01); G03F 7/426 (2013.01);
Abstract
Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: